Plasma Etching: Fundamentals And Applications (Series On Semiconductor Science And Technology)
Plasma Etching: Fundamentals and Applications (Series on Semiconductor Science and Technology)
This book focuses on the remarkable recent advances in understanding low pressure radio frequency glow discharges. It explains the basic analytical theory, plasma physics, and plasma diagnostics, before proceeding to the details of the etching process.
About the Author
Professor Minoru Sugawara, Hachinohe Institute of Technology, Hachinohe-city, Aomori 031, Japan. Fax: (0) 178 25 1430